SURFACE INSPECTION DEVICE, SURFACE INSPECTION METHOD, AND EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a surface inspection device capable of determining a difference in scan accuracy resulting from a difference in a scanning direction during exposure.

SOLUTION: A surface inspection device includes: an illumination system 20 that illuminates a wafer having a pattern produced by light exposure with illumination light; a light-receiving system 30 and an image pick-up device 35 that detect the illumination light reflected by the pattern; and an inspection unit 42 that determines a line width of the pattern from a diffraction image of the wafer picked up by the image pick-up device 35 to determine a difference in line width of the pattern by scanning directions.

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