发明名称
摘要 <p>Disclosed in this specification is a process for refurbishing a spent sputtering target. The process includes the step of applying sufficient heat and axial force to the filled sputtering target to hot press the filled sputtering target such that the powdered metal fuses with the un-sputtered metal, producing a refurbished target. The process may be used to refurbish precious metal targets, such as ruthenium targets.</p>
申请公布号 JP5204124(B2) 申请公布日期 2013.06.05
申请号 JP20090543294 申请日期 2008.07.16
申请人 发明人
分类号 C23C14/34;B22F1/02;B22F3/14 主分类号 C23C14/34
代理机构 代理人
主权项
地址