发明名称 GaAs WAFER AND METHOD FOR PRODUCING GaAs WAFER
摘要 <P>PROBLEM TO BE SOLVED: To provide a GaAs wafer capable of restraining the generation of slip, even if making that have a large diameter, and a method for producing the same. <P>SOLUTION: This method for producing GaAs wafer includes a growing process in which GaAs single crystal is grown by the LEC method and a wafer preparing process in which the GaAs single crystal obtained in the growing process is sliced to make the GaAs wafer, where sulfur is added in the raw material so that the sulfur atom concentration in the GaAs single crystal obtained in the growing process becomes uniformly not lower than 2&times;10<SP POS="POST">14</SP>cm<SP POS="POST">-3</SP>. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013095634(A) 申请公布日期 2013.05.20
申请号 JP20110239964 申请日期 2011.11.01
申请人 HITACHI CABLE LTD 发明人 KIMURA TAKESHI
分类号 C30B29/42;C30B15/04;C30B27/02 主分类号 C30B29/42
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