发明名称 |
SYSTEM, METHOD AND APPARATUS FOR PLASMA SHEATH VOLTAGE CONTROL |
摘要 |
A system, method and apparatus for increasing an energy level of the ions emitted from a plasma include a plasma chamber, including a top electrode and a bottom electrode, a multiple RF sources, at least one of the RF sources being coupled to the bottom electrode. A phase locking circuit is coupled to at least two of the RF sources hereafter designated the first RF source and the second RF source. A controller is coupled to the plasma chamber, each of the RF sources and the phase locking circuit. The controller including operating system software, multiple logic circuits and a process recipe.
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申请公布号 |
US2013122711(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
US201113294053 |
申请日期 |
2011.11.10 |
申请人 |
MARAKHTANOV ALEXEI;DHINDSA RAJINDER;HUDSON ERIC;BAILEY, III ANDREW D. |
发明人 |
MARAKHTANOV ALEXEI;DHINDSA RAJINDER;HUDSON ERIC;BAILEY, III ANDREW D. |
分类号 |
H01L21/3065;C23F1/08 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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