发明名称 Semiconductor Device and Substrate with Chalcogen Doped Region
摘要 A semiconductor substrate includes a first side and a second side opposite the first side. A semiconductor material extends between the first and second sides and is devoid of active device regions. The semiconductor material has a first region and a second region. The first region extends from the first side to a depth into the semiconductor material and includes chalcogen dopant atoms which provide a base doping concentration for the first region. The second region extends from the first region to the second side and is devoid of base doping. Further, a power semiconductor component is provided.
申请公布号 US2013119522(A1) 申请公布日期 2013.05.16
申请号 US201213709786 申请日期 2012.12.10
申请人 INFINEON TECHNOLOGIES AG;INFINEON TECHNOLOGIES AG 发明人 SCHMIDT GERHARD;SCHULZE HANS-JOACHIM;KOLBESEN BERND
分类号 H01L29/06 主分类号 H01L29/06
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