EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source apparatus capable of stably generating extreme ultraviolet light for a long period by preventing debris moving in a chamber from degrading the reflectance or transmissivity of an optical element such as an EUV collector mirror.

SOLUTION: An extreme ultraviolet light source apparatus comprises: a driver laser which generates a first plasma by emitting laser light onto a target supplied to a plasma emission point in a chamber; a gas supply device for supplying gas into the chamber; a high-frequency excitation device which includes an RF antenna arranged so that the plasma emission point is located at the center, and which excites the gas and an electrically neutral target material so as to generate a second plasma for charging electrically neutral debris; a magnetic field generating device which generates a magnetic field for limiting the movement direction of the charged debris; and an exhaust device which exhausts the chamber so that the debris released from the first plasma and gasified in the second plasma is discharged out of the chamber.

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