发明名称 APPARATUS AND METHOD FOR MANUFACTURING FINE PATTERN USING INTERFEROGRAM OF OPTICAL AXIS DIRECTION
摘要 PURPOSE: A micropatterns manufacturing apparatus is provided to irradiate a photosensitive film with interferential laser beam by including an interference formation part. CONSTITUTION: A micropatterns manufacturing apparatus comprises a laser generating part, beam splitter, plane mirror(250), a spherical mirror(240), an analyser(50), and an exposure lens. The laser generator generates a laser beam(1) with a first specific width. The bam splitter radiates a first laser beam(2) by reflecting a first specific width. The beam splitter reflects parts of the laser beam. The plane mirror reflects the first laser beam and allows the first laser beam to flow into the beam splitter. The exposure lens transmits through the first laser beam and the second laser beam; and the first laser beam and the second laser beam are emitted to the photosensitive film.
申请公布号 KR20130042951(A) 申请公布日期 2013.04.29
申请号 KR20110107131 申请日期 2011.10.19
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 RHEE, HYUG GYO;LEE, YUN WOO
分类号 G03F7/20;G03F7/00;G03F7/207;G03F9/00 主分类号 G03F7/20
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