| 摘要 |
PURPOSE: A rapid thermal processing apparatus for a double chamber is provided to maintain the constant temperature of the chamber by using heating sources which are formed in the upper unit and the lower unit of a second chamber. CONSTITUTION: A main chamber(100) includes a first chamber(110) and a second chamber(120). A buffer chamber(150) is connected to the main chamber through the opening/closing door(116) of the first chamber. A control module controls the operation of the main chamber. The second chamber includes an upper unit(130) and a lower unit(140). The control module controls the upper and the lower unit to adjust the temperature. [Reference numerals] (AA) Controller 1; (BB) Controller 2; (CC) Controller 4; (DD) Controller 3; |
