发明名称 METHOD FOR STRIPPING GaN FROM SAPPHIRE SUBSTRATE WITHOUT DAMAGE BY USING SOLID-STATE LASER
摘要 <p>A method for nondestructive laser lift-off of GaN from sapphire substrates utilizing a solid-state laser is disclosed in the present invention, wherein, a solid-state laser is used as the laser source, and a small laser-spot with a circumference of 3 to 1000 micrometers and a distance of two farthest corners or a longest diameter of no more than 400 micrometers is used for laser scanning point-by-point and line-by-line, wherein the energy in the small laser-spot is distributed such that the energy in the center of the laser-spot is the strongest and is gradually reduced toward the periphery. According to the present invention, a nondestructive laser lift-off with a small laser-spot is achieved, and a scanning mode of the laser lift-off is improved, thereby a lift-off method without the need of aiming is achieved. As a result, the laser lift-off process is simplified, and the efficiency is improved while the rejection rate is reduced, such that the obstacles of the industrialization of the laser lift-off process are removed.</p>
申请公布号 EP2346066(A4) 申请公布日期 2013.04.24
申请号 EP20090824334 申请日期 2009.04.21
申请人 SINO NITRIDE SEMICONDUCTOR CO, LTD 发明人 ZHANG, GUOYI;SUN, YONGJIAN;KANG, XIANGNING;CHEN, ZHIZHONG;YANG, ZHIJIAN;YANG, XINRONG
分类号 H01L21/00;B23K26/40;C30B29/40;H01L21/683;H01L33/00 主分类号 H01L21/00
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