发明名称 |
TRANSPARENT GAS BARRIER FILM AND THE FABRICATION METHOD |
摘要 |
PURPOSE: A transparent gas barrier film with inorganic composition slope gradient is provided to simply and cheaply obtain inorganic composition slope gradient only by treating with UV ray. CONSTITUTION: A transparent gas barrier film comprises a substrate containing silicon, with an organic-inorganic hybrid section with inorganic composition slope gradient. The surface of the substrate contains 70% or more inorganic. A method for preparing the film comprises: a step of preparing the substrate containing silicon; and a step of treating the surface with UV ray and ozone to form the inorganic composition slope gradient.
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申请公布号 |
KR20130039940(A) |
申请公布日期 |
2013.04.23 |
申请号 |
KR20110104624 |
申请日期 |
2011.10.13 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
KIM, WON JUNG;GO, JOENG JU;KWAK, BYEONG DO;KEE, SEUNG BEOM;KIM, JUNG SEOB;PARK, YONG WAN;JUNG, KYEONG TAEK |
分类号 |
C08J5/18;C08J5/24;C08J7/18;C08L83/04 |
主分类号 |
C08J5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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