发明名称 TRANSPARENT GAS BARRIER FILM AND THE FABRICATION METHOD
摘要 PURPOSE: A transparent gas barrier film with inorganic composition slope gradient is provided to simply and cheaply obtain inorganic composition slope gradient only by treating with UV ray. CONSTITUTION: A transparent gas barrier film comprises a substrate containing silicon, with an organic-inorganic hybrid section with inorganic composition slope gradient. The surface of the substrate contains 70% or more inorganic. A method for preparing the film comprises: a step of preparing the substrate containing silicon; and a step of treating the surface with UV ray and ozone to form the inorganic composition slope gradient.
申请公布号 KR20130039940(A) 申请公布日期 2013.04.23
申请号 KR20110104624 申请日期 2011.10.13
申请人 CHEIL INDUSTRIES INC. 发明人 KIM, WON JUNG;GO, JOENG JU;KWAK, BYEONG DO;KEE, SEUNG BEOM;KIM, JUNG SEOB;PARK, YONG WAN;JUNG, KYEONG TAEK
分类号 C08J5/18;C08J5/24;C08J7/18;C08L83/04 主分类号 C08J5/18
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