发明名称 CURABLE COMPOSITION FOR IMPRINT, METHOD FOR FORMING PATTERN, AND PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a curable composition for imprint, improved in surface roughness of a cured film. <P>SOLUTION: A curable composition for imprint contains: (A) a polymerizable compound; (B) a polymerization initiator; and (C) a nonpolymerizable compound. The curable composition for imprint contains, as the nonpolymerizable compound (C), (C1) at least one kind of surfactants containing 20 mass% or more of fluorine atoms and (C2) at least one kind of polymers containing 3 mass% or more and less than 20 mass% of fluorine atoms and/or 5 mass% or more and less than 40 mass% of silicon atoms and having a weight average molecular weight (Mw) of 1,000-100,000. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013074015(A) 申请公布日期 2013.04.22
申请号 JP20110210530 申请日期 2011.09.27
申请人 FUJIFILM CORP 发明人 ENOMOTO YUICHIRO;KODAMA KUNIHIKO;TARUYA SHINJI
分类号 H01L21/027;B29C59/02;C08F2/44 主分类号 H01L21/027
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