发明名称 POST-CMP CLEANING BRUSH
摘要 Embodiments of the invention include a CMP brush that has a combination of central nodules at an inner region of the brush and one or more edge nodules at an end region of the brush where the central nodules and edge nodules are in a staggered or matched arrangement with each other and an upper surface of each edge nodule on the brush has the same or a greater contact area than an upper surface of a central nodule. The area of contact of the upper surface of each edge nodule with the substrate edge region is the same or greater than the area of contact of the upper surface of a central nodule with the substrate center region.
申请公布号 KR20130038806(A) 申请公布日期 2013.04.18
申请号 KR20127023563 申请日期 2011.02.21
申请人 ENTEGRIS, INC. 发明人 WARGO CHRISTOPHER;SINGH RAKESH;TRIO DAVID;MCNAMARA ERIC
分类号 H01L21/302 主分类号 H01L21/302
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