发明名称 Selective Epitaxial Growth of Semiconductor Materials with Reduced Defects
摘要 A semiconductor device includes a substrate formed of a first semiconductor material; two insulators on the substrate; and a semiconductor region having a portion between the two insulators and over the substrate. The semiconductor region has a bottom surface contacting the substrate and having sloped sidewalls. The semiconductor region is formed of a second semiconductor material different from the first semiconductor material.
申请公布号 US2013087831(A1) 申请公布日期 2013.04.11
申请号 US201213686708 申请日期 2012.11.27
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, L;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIN JING-CHENG;YU CHEN-HUA
分类号 H01L21/02;H01L29/165;H01L29/267 主分类号 H01L21/02
代理机构 代理人
主权项
地址