发明名称 Manufacturing method for manufacturing two-dimensional collimator, involves carrying out aftertreatment of prepared collimator by using blasting method
摘要 <p>#CMT# #/CMT# The manufacturing method involves carrying out an aftertreatment of a prepared collimator (1) by using a blasting method. The aftertreatment is carried out with a range of process tolerances (2) for removing and smoothing a surface. The collimator is prepared by melting process, particularly by selective laser melting process. The tolerances is removed by multiple beam particles, particularly spheres, radiated through the collimator, where the beam particles have round or oval shape. #CMT# : #/CMT# An independent claim is included for a collimator, particularly two-dimensional collimator, for scattered beam attenuation in a detector, particularly in an x-ray detector of a computed tomography system. #CMT#USE : #/CMT# Manufacturing method for manufacturing a two-dimensional collimator (Claimed). #CMT#ADVANTAGE : #/CMT# The manufacturing method involves carrying out an aftertreatment of a prepared collimator by using a blasting method, where the aftertreatment is carried out with a range of process tolerances for removing and smoothing a surface, and hence ensures removing the tolerances from the surfaces without damaging the collimator. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic top view of a collimator with an untreated area and treated area. 1 : Collimator 2 : Range of process tolerances 3 : Grid bars 4 : Untreated area 5 : Treated area.</p>
申请公布号 DE102011083422(A1) 申请公布日期 2013.03.28
申请号 DE20111083422 申请日期 2011.09.26
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 MIESS, MICHAEL;WIRTH, STEFAN, DR.
分类号 G21K1/02;A61B6/03;A61N5/10 主分类号 G21K1/02
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