| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a buffer layer of a photoelectric conversion device having higher quality at lower costs. <P>SOLUTION: A chemical bath deposition apparatus 1 includes: a reaction vessel 3 for containing a reaction solution 2 for chemical bath deposition to form a film on a deposition surface 10a of a substrate 10 for film deposition; a substrate holding section 20 for holding the substrate 10 for film deposition such that at least the deposition surface 10a contacts the reaction solution 2, the substrate holding section including a fixing surface 21a made of stainless steel on which a back side of the substrate 10 for film deposition is closely fixed; a heater 30 disposed at a rear side of the fixing surface 21a, the heater heating the substrate 10 for film deposition from the back side thereof; and a reaction solution temperature control unit 40 for controlling the temperature of the reaction solution 2 in the reaction vessel 3. <P>COPYRIGHT: (C)2013,JPO&INPIT |
