发明名称 METALLURGICAL CLAMSHELL METHODS FOR MICRO LAND GRID ARRAY FABRICATION
摘要 A structure and method for manufacturing the same for manufacturing a contact structure for microelectronics manufacturing including the steps of forming first and second metal sheets to form a plurality of outwardly extending bump each defining a cavity. Symmetrically mating the first and second metal sheets in opposing relation to each other to form upper and lower bumps each defining an enclosure therebetween wherein the mated first and second sheets form a contact structure. Coating the contact structure with an insulating material, and fabricating helix shaped contacts from upper and lower bumps. The helix shaped contacts having first and second portions being in minor image relationship to each other.
申请公布号 US2013072073(A1) 申请公布日期 2013.03.21
申请号 US201213588585 申请日期 2012.08.17
申请人 HOUGHAM GARETH;MCVICKER GERARD;GU XIAOXIONG;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HOUGHAM GARETH;MCVICKER GERARD;GU XIAOXIONG
分类号 H01R13/02 主分类号 H01R13/02
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