| 摘要 |
PURPOSE: A substrate processing apparatus is provided to remove processing solution drops from a nozzle without contact with the nozzle by including a processing solution removing member using a capillary phenomenon. CONSTITUTION: A processing solution supply unit supplies processing solutions to a substrate loaded on a substrate support unit and includes a nozzle, a standby port, and a nozzle moving unit. The nozzle includes a spray head to spray the processing solutions to the substrate loaded on the substrate support unit. The standby port includes a housing and a processing solution removing member(450). A processing solution removing member removes processing solution drops from the nozzle in a housing and includes a processing solution inhalation block with a plurality of capillary tubes(458).
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