| 摘要 |
A method for forming a pattern using self-alignment of a terminal functional group is provided to improve a contact angle of a pattern by using self-alignment caused by mutual repulsion of a hydrophobic functional group and a hydrophilic functional group. A first monolayer(110) made of a material having a functional group of a first polarity is formed on the upper surface of a substrate(100). A second monolayer(120) made of a material having a functional group of a second polarity opposite to the first polarity is formed between the first monolayers. A solution containing a device material distributed into a solvent having the functional group of the first or second polarity is coated on the upper surface of the substrate. A heat treatment is performed on the substrate coated with the device material to form a pattern on the substrate. The first polarity can be a phenyl group. The solvent can be a hydrophilic solvent. |
