发明名称 |
Method of forming strontium titanate films |
摘要 |
Embodiments of the current invention include methods of forming a strontium titanate (SrTiO3) film using atomic layer deposition (ALD). More particularly, the method includes forming a plurality of titanium oxide (TiO2) unit films using ALD and forming a plurality of strontium oxide (SrO) unit films using ALD. The combined thickness of the TiO2 and SrO unit films is less than approximately 5 angstroms. The TiO2 and SrO units films are then annealed to form a strontium titanate layer.
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申请公布号 |
US2013059066(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
US201213658595 |
申请日期 |
2012.10.23 |
申请人 |
INTERMOLECULAR, INC;INTERMOLECULAR, INC. |
发明人 |
RUI XIANGXIN;BUCHANAN IAIN;KIM MOO-SUNG;LEI XINJIAN;MATZ LAURA;SHANKER SUNIL |
分类号 |
B05D5/12 |
主分类号 |
B05D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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