发明名称 Memory cell formed using a recess and methods for forming the same
摘要 In a first aspect, a method of forming a memory cell is provided, the method including: (1) forming a pillar above a substrate, the pillar comprising a steering element and a metal hardmask layer; (2) selectively removing the metal hardmask layer to create a void; and (3) forming a carbon-based switching material within the void. Numerous other aspects are provided.
申请公布号 US8389375(B2) 申请公布日期 2013.03.05
申请号 US20100703907 申请日期 2010.02.11
申请人 MAXWELL STEVEN;SANDISK 3D LLC 发明人 MAXWELL STEVEN
分类号 H01L29/93;G11C11/21 主分类号 H01L29/93
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