| 摘要 |
PURPOSE: A purification method of a polycarbonate is provided to contact-extruding acetone and pentanone by using a solvent mixed to optimized ratio, thereby efficiently removing low molecular weight compounds and volatile organic compounds which effect silicon wafer rest in a polycarbonate resin. CONSTITUTION: A purification method of a polycarbonate comprises: a step of manufacturing mixed solvent by mixing acetone and pentanone; a step of putting the mixed solvent into a chamber, and rising the temperature of the chamber to 40-70 °C under nitrogen atmosphere; a step of putting the polycarbonate into the chamber; a step of contact-extraction by mixing the mixed solvent and the polycarbonate for 30 minutes - 3 hours under the nitrogen atmosphere and the chamber temperature; a step of separating the mixed solvent and the polycarbonate; and a step of removing the mixed solvent by drying the polycarbonate. |
