| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an etalon filter capable of suitably performing FSR adjustment. <P>SOLUTION: The method for manufacturing an etalon filter 1 includes: a step ST1 for determining design thickness d<SB POS="POST">t</SB>of a substrate 3; a step ST2 for preparing a plurality of design combination candidates for plural thin films 7 composing a second reflection film 5B, having mutually different ΔFSR values; a step ST3 for forming the substrate 3; a step ST4 for measuring actual thickness d<SB POS="POST">r</SB>of the substrate 3; a step ST5 for forming a first reflection film 5A; steps ST6 to ST8 for selecting one candidate from the plurality of candidates on the basis of comparison between the thickness d<SB POS="POST">t</SB>and the thickness d<SB POS="POST">r</SB>; and a step ST9 for using the selected combination candidate for the plural thin films 7 to form the second reflection film. In addition, the ΔFSR is a variation obtained by comparison of the FSR values when the first reflection film 5A and the second reflection film 5B are formed and not formed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
