发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition giving a cured film exhibiting excellent high adhesion, high transparency and antistatic properties without deteriorating high heat resistance of a coating film. <P>SOLUTION: The photosensitive composition is an active energy ray-curable photosensitive composition including 4-(meth)acryloylmorpholine (A); a bifunctional (meth)acrylate (B) (with number average molecular weight of 200-100,000 preferably) having a polyoxyalkylene chain; a (meth)acrylate (C) (with number average molecular weight of 200-100,000 preferably) having an isocyanurate skeleton; and a polymerization initiator (D). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013018842(A) 申请公布日期 2013.01.31
申请号 JP20110152140 申请日期 2011.07.08
申请人 SANYO CHEM IND LTD 发明人
分类号 C08F220/36;C08F2/50;C08F290/06;C09D4/02;C09D7/12;C09D11/00;C09J4/02;C09J11/06 主分类号 C08F220/36
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