| 摘要 |
A titanium dioxide coating method is disclosed. An electrolyte containing Ti3+, an oxidant, and at least one of NO3− and NO2− is provided for an electrodeposition device, wherein the oxidant is configured for essentially oxidizing Ti3+ into Ti4+. A substrate is immersed into the electrolyte and electrically connected to the electrodeposition device. A cathodic current is applied to the substrate via the electrodeposition device for reduction of NO2− or NO3−. A titanium dioxide film is thus formed on the surface of the substrate. The thickness, porosity, and morphology of the titanium dioxide film can be controlled by varying the electroplating parameters, and relatively uniform deposits on various substrates of complex shapes can be obtained by use of low cost instruments. The resultant structure of Ti4+ species oxidized from Ti3+ by the oxidant can be used to control the deposition rate of TiO2.
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