发明名称 Radiation pattern control
摘要 An apparatus including: a first antenna element; a second antenna element; a ground plane element for at least one of the first and second antenna elements; a first choke arranged to affect a first maximum of current density produced in the ground plane element by the first antenna element; and a second choke arranged to affect a second maximum of current density produced in the ground plane element by the second antenna element.
申请公布号 US8362957(B2) 申请公布日期 2013.01.29
申请号 US20070449631 申请日期 2007.02.28
申请人 NOKIA CORPORATION;LEHTOLA ANTERO;ARKKO AIMO 发明人 LEHTOLA ANTERO;ARKKO AIMO
分类号 H01Q1/38 主分类号 H01Q1/38
代理机构 代理人
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