发明名称 |
Radiation pattern control |
摘要 |
An apparatus including: a first antenna element; a second antenna element; a ground plane element for at least one of the first and second antenna elements; a first choke arranged to affect a first maximum of current density produced in the ground plane element by the first antenna element; and a second choke arranged to affect a second maximum of current density produced in the ground plane element by the second antenna element.
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申请公布号 |
US8362957(B2) |
申请公布日期 |
2013.01.29 |
申请号 |
US20070449631 |
申请日期 |
2007.02.28 |
申请人 |
NOKIA CORPORATION;LEHTOLA ANTERO;ARKKO AIMO |
发明人 |
LEHTOLA ANTERO;ARKKO AIMO |
分类号 |
H01Q1/38 |
主分类号 |
H01Q1/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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