NANOSTRUCTURE PRODUCTION METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a nanostructure or nanomaterial at low substrate temperature.

SOLUTION: The method includes the steps of: providing a thermal control barrier on a substrate as a substantially continuous layer; providing gas plasma; providing a gas plasma; preceeding additional heating to thermal control barrier from an upper side of the layer by a heat source which is different from the gas plasma; and forming a nanostructure or nanomaterial on the layer of the substrate by the plasma chemical vapor deposition method using the gas plasma while additionally heating.

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