| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition excellent in light blocking effect, that is, having a high OD value and capable of forming a fine pattern with high dimensional accuracy. <P>SOLUTION: The positive photosensitive resin composition comprises at least a binder resin (1), a 1,2-quinonediazide compound (2) and a pigment (3), wherein a reaction product (X) obtained by reacting an epoxy adduct having a structure in which an unsaturated monobasic acid (B) is added to a polyfunctional epoxy resin (A) with a polybasic acid anhydride (C) is used as the binder resin (1). <P>COPYRIGHT: (C)2008,JPO&INPIT |
