发明名称 |
SILICON CARBIDE SEMICONDUCTOR DEVICE HAVING RADIATION RESISTANCE BY SUPERLATTICE STRUCTURE AND ITS OPERATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a silicon carbide semiconductor device that can be stably operated even under a severe irradiation environment of radiation ray such as the vicinity of a nuclear reactor or a nuclear fusion reactor, and to provide its operation method. SOLUTION: The silicon carbide semiconductor device is composed so as to inhibit penetration of a radiation into the device by reflecting and dispersing the radiation emitted from the outside on a large number of interfaces in an insulating film, while making the insulating film such as a surface protection film formed on a silicon carbide epitaxial film and an interlayer insulating film as a superlattice multilayer structure such as a multilayer film in which an SiO<SB>2</SB>film and an SiN film are alternately laminated. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007220888(A) |
申请公布日期 |
2007.08.30 |
申请号 |
JP20060039357 |
申请日期 |
2006.02.16 |
申请人 |
CENTRAL RES INST OF ELECTRIC POWER IND |
发明人 |
NAGANO MASAHIRO;NAKAMURA TOMONOBU;TSUCHIDA SHUICHI |
分类号 |
H01L23/522;C23C16/42;H01L21/283;H01L21/316;H01L21/318;H01L21/768 |
主分类号 |
H01L23/522 |
代理机构 |
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代理人 |
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地址 |
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