ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE

摘要

An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a compound represented by the following formula (I); and (B) a resin: wherein X represents an oxygen atom, a sulfur atom or -N(Rx)-; each of R1 to R8 and Rx independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an alkylcarbonyloxy group, an aryl group, an aryloxy group, an aryloxycarbonyl group or an arylcarbonyloxy group; and R1 to R8 may combine with each other to form a ring, provided that at least two members out of R1 to R8 represent a structure represented by the following formula (II) as defined in the specification.