| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a colored photosensitive resin composition showing excellent developability during forming a pattern and enabling formation of a pattern with high hardness. <P>SOLUTION: The colored photosensitive resin composition includes: (A1) a pigment comprising a salt-forming compound of an acidic dye and a basic dye; (B) a copolymer having a structural unit derived from at least one kind selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a structural unit derived from a monomer having a C2-C4 cyclic ether structure and an ethylenically unsaturated bond; (C) a polymerizable compound; and (D) a polymerization initiator. <P>COPYRIGHT: (C)2013,JPO&INPIT |
