发明名称 |
FIELD-EFFECT TRANSISTOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To relax the electric field of a drain end of a gate electrode and reduce the breakage of a gate insulating film. <P>SOLUTION: A field-effect transistor 100 comprises: a channel layer 108 that is made form a nitride semiconductor; an electron supply layer 112 that is formed above the channel layer 108 and is made from a nitride semiconductor having a larger band gap energy than the channel layer; a source electrode 116 and a drain electrode 118 that are formed above the channel layer 108; a gate electrode 120 that is formed above the channel layer 108; a hole extracting portion 126 that is formed above the channel layer 108 and extracts holes from the channel layer 108; and a connection portion 124 that electrically connects the gate electrode 120 and the hole extracting portion 126. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012248636(A) |
申请公布日期 |
2012.12.13 |
申请号 |
JP20110118420 |
申请日期 |
2011.05.26 |
申请人 |
ADVANCED POWER DEVICE RESEARCH ASSOCIATION |
发明人 |
TAMURA RYOSUKE;UENO KATSUNORI |
分类号 |
H01L21/338;H01L21/336;H01L29/47;H01L29/778;H01L29/78;H01L29/812;H01L29/872 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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