发明名称 FIELD-EFFECT TRANSISTOR
摘要 <P>PROBLEM TO BE SOLVED: To relax the electric field of a drain end of a gate electrode and reduce the breakage of a gate insulating film. <P>SOLUTION: A field-effect transistor 100 comprises: a channel layer 108 that is made form a nitride semiconductor; an electron supply layer 112 that is formed above the channel layer 108 and is made from a nitride semiconductor having a larger band gap energy than the channel layer; a source electrode 116 and a drain electrode 118 that are formed above the channel layer 108; a gate electrode 120 that is formed above the channel layer 108; a hole extracting portion 126 that is formed above the channel layer 108 and extracts holes from the channel layer 108; and a connection portion 124 that electrically connects the gate electrode 120 and the hole extracting portion 126. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012248636(A) 申请公布日期 2012.12.13
申请号 JP20110118420 申请日期 2011.05.26
申请人 ADVANCED POWER DEVICE RESEARCH ASSOCIATION 发明人 TAMURA RYOSUKE;UENO KATSUNORI
分类号 H01L21/338;H01L21/336;H01L29/47;H01L29/778;H01L29/78;H01L29/812;H01L29/872 主分类号 H01L21/338
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