发明名称
摘要 <p>In a probe manufacturing method, after a metal material for a probe is deposited on a base table, the probe can be detached from the base table relatively easily without damaging the probe. A recess corresponding to a flat surface shape of a probe is formed by a resist mask on a sacrificial layer on a base table, and a probe is formed by depositing a probe material in the recess. Thereafter, the resist mask is removed, and further the sacrificial layer is removed by an etching process with a part of the sacrificial layer remaining. For the purpose of forming an opening for control of the remaining part of the sacrificial layer in the etching process in the probe so as to let the opening pass through the probe in its plate thickness direction, a hole-forming portion for the opening is formed in the resist mask. Etching of the sacrificial layer in the etching process is promoted from an edge of the opening formed in the probe by this hole-forming portion.</p>
申请公布号 JP5096737(B2) 申请公布日期 2012.12.12
申请号 JP20060336687 申请日期 2006.12.14
申请人 发明人
分类号 G01R1/067;G01R31/26;H01L21/66 主分类号 G01R1/067
代理机构 代理人
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