| 发明名称 |
APPARATUS AND PROCESS FOR ATOMIC LAYER DEPOSITION |
| 摘要 |
Provided are atomic layer deposition apparatus and methods including multiple gas distribution plates including stages for moving substrates between the gas distribution plates. |
| 申请公布号 |
WO2012118952(A3) |
申请公布日期 |
2012.12.06 |
| 申请号 |
WO2012US27247 |
申请日期 |
2012.03.01 |
| 申请人 |
APPLIED MATERIALS, INC.;YUDOVSKY, JOSEPH |
发明人 |
YUDOVSKY, JOSEPH |
| 分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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