| 摘要 |
PURPOSE: A vapor delivery device, a manufacturing method thereof, and the use thereof are provided to maintain the vapor of a solid precursor at high, uniform density. CONSTITUTION: A delivery system comprises a delivery device with inlet and outlet ports, a first proportional control valve(112), a second proportional control valve(114), a mixing device which operates to mix first stream and second stream, a chemical sensor(104) located in the downstream of a mixing chamber to analyze the chemical contents of fluid stream from the delivery device and connected to the first proportional control valve, and a first pressure/flow controller(108) connected to the chemical sensor and the first proportional control valve. The delivery system delivers a uniform mole of precursor vapor per unit volume of carrier gas to a plurality of reactors(200). |
