发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME |
摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.
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申请公布号 |
US2012301831(A1) |
申请公布日期 |
2012.11.29 |
申请号 |
US201113521332 |
申请日期 |
2011.03.04 |
申请人 |
FUJII KANA;TOMICA TAKAMITSU;FUJIMORI TORU;FUJIFILM CORPORATION |
发明人 |
FUJII KANA;TOMICA TAKAMITSU;FUJIMORI TORU |
分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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