| 摘要 |
<p>Provided is a vacuum processing device capable of replacing an alignment mask without exposing the inside of a vacuum chamber to air. A plate (23), into which a substrate lifting and lowering pin (46) and a mask lifting and lowering pin (45) that is longer in a vertical direction than the substrate lifting and lowering pin (46) are inserted, is disposed below a gas introduction device (12). A pin supporting member (24) is disposed below the plate (23). The pin supporting member (24) is structured so that when the distance from the plate (23) is made to be close to a first distance or less, the substrate lifting and lowering pin (46) and the mask lifting and lowering pin (45) can be each vertically mounted on the pin supporting member (24). The substrate lifting and lowering pin (46) and the mask lifting and lowering pin (45) are each provided with a locking member (47). The locking member (47) is used for suspending the substrate lifting and lowering pin (46) and the mask lifting and lowering pin (45) by the plate (23), above the pin supporting member (24), apart from the pin supporting member (24), when the distance between the plate (23) and the pin supporting member (24) is set to a second distance or more having a wider separation than the first distance.</p> |
