发明名称 WIEN E×B MASS FILTER OF ABERRATION CORRECTION FOR REMOVING NEUTRAL MATERIAL FROM BEAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a mass filter for focus ion beam device which selects a desired ion species from a plurality of ion sources with no color aberration. <P>SOLUTION: Multiple ions 110 generated from an ion source 114 pass through an upper lens 106 to form a substantially parallel beam 310 which impinges on a mass filter 304. The mass filter 304 consists of an upper EXB filter 306U and a lower EXB filter 306L having central axes offset from each other, and the beam 310 is separated and deflected for each mass before exiting as a trajectory parallel with the optical axis 380. Color aberration generated from the upper EXB filter 306U is canceled by the lower EXB filter 306L. Thereafter, only the desired ions 332 are passed by a mass separation aperture 342, and focused on a substrate 112 by means of a lower lens 108. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012227141(A) 申请公布日期 2012.11.15
申请号 JP20120088772 申请日期 2012.04.09
申请人 FEI CO 发明人 DAVID TUGGLE;N WILLIAM PARKER;MARK W UTLAUT
分类号 H01J37/05;H01J37/09;H01J37/317 主分类号 H01J37/05
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