| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material having high sensitivity, capability of low-temperature curing, enough heat resistance and tough film quality. <P>SOLUTION: A chemical amplification positive photosensitive composition contains (A) a compound with alkali solubility increased with an acid, (B) a compound generating an acid by irradiation with an active ray and/or radiation and (C) a crosslinking agent, where the above (C) crosslinking agent is represented by the formula (I) and the number average molecular weight is 600 to 2000. Formula (I) (in which, A comprises -O- and a divalent organic group and includes at least a partial structure represented by the formula (I-2).) Formula (I-2) (X represents a divalent organic group.) <P>COPYRIGHT: (C)2013,JPO&INPIT |
