| 摘要 |
<p>PURPOSE: A method for producing super high-purity Ru powder and target using waste Ru targets is provided to improve the function of a sputtering target material by pulverizing Ru powder and target using plasma instead of rough crushing. CONSTITUTION: A method for producing super high-purity Ru powder and target using waste Ru targets comprises the steps of: removing pollutants remaining on the surface of waste Ru targets with a chemical or mechanical method, producing Ru powder from the waste Ru targets using plasma, heat-treating and pulverizing the Ru powder to obtain high-purity Ru powder, press-molding the high-purity Ru powder to obtain a high-density sintered Ru body, and post-processing the sintered Ru body into a Ru target with controlled surface roughness.</p> |
