PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND PLASMA ETCHING DEVICE,申请号KR20127023123-传众专利搜索

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发明名称	PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND PLASMA ETCHING DEVICE
摘要
申请公布号	KR20120120400(A)	申请公布日期	2012.11.01
申请号	KR20127023123	申请日期	2011.03.03
申请人		发明人
分类号	H01L21/3065	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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