发明名称 |
Thermal flux annealing influence of buried species |
摘要 |
A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation. |
申请公布号 |
US8288239(B2) |
申请公布日期 |
2012.10.16 |
申请号 |
US20020261379 |
申请日期 |
2002.09.30 |
申请人 |
JENNINGS DEAN C.;AL-BAYATI AMIR;APPLIED MATERIALS, INC. |
发明人 |
JENNINGS DEAN C.;AL-BAYATI AMIR |
分类号 |
H01L21/336;B23K26/073;H01L21/265;H01L21/268;H01L21/324 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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