发明名称 Thermal flux annealing influence of buried species
摘要 A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.
申请公布号 US8288239(B2) 申请公布日期 2012.10.16
申请号 US20020261379 申请日期 2002.09.30
申请人 JENNINGS DEAN C.;AL-BAYATI AMIR;APPLIED MATERIALS, INC. 发明人 JENNINGS DEAN C.;AL-BAYATI AMIR
分类号 H01L21/336;B23K26/073;H01L21/265;H01L21/268;H01L21/324 主分类号 H01L21/336
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