COPOLYMER FOR RESIST COMPRISING NOVEL ACRYL BASED MONOMER AND RESIN COMPOSITION FOR RESIST COMPRISING THE SAME

摘要

PURPOSE: A copolymer and a resin composition including the same for a resist are provided to overcome reduction of line edge roughness in an immersion exposure operation using ArF. CONSTITUTION: A copolymer for a resist includes a norbornene derivative and at least one monomer of acryl-based monomers represented by chemical formulas 1 and 2 as a repeating unit. A resin composition for the resist includes a copolymer represented by chemical formula 3, a photo-acid generator, and a solvent. In chemical formula 3, R1 to R3 each are C1-30 alkyl groups or C3-30 cycloalkyl groups with or without hydrogen atoms, ether groups, ester groups, carbonyl groups, acetal groups, epoxy groups, nitrile groups, or aldehyde groups; R4 to R6 each are hydrogen atoms or methyl groups; l, m, n, and o are the numbers of repeating units in a main chain; the sum of l, m, n, and o is 1; l/(l+m+n+o) is more than or equal to 0 and is less than 0.4; m/(l+m+n+o) is more than 0 and is less than 0.6; n/(l+m+n+o) is more than or equal to 0 and is less than 0.6; and o/(l+m+n+o) is more than 0 and is less than 0.4.