NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION

摘要

[Problem] To provide a negative photosensitive resin composition, which can be formed into a thick film even a solution thereof has a low viscosity, which is free from tack even before exposure, which can be patterned with high resolution by alkaline development, and a coating film formed from which has high transparency and is reduced in shrinkage after post baking. [Solution] A photosensitive resin composition which contains the following component (A), component (B), component (C) and component (D). Component (A): an acrylic copolymer which is obtained by copolymerizing a monomer mixture that contains at least (i) maleimide and (ii) a monomer having an epoxy group Component (B): a photoacid generator Component (C): a compound having two or more epoxy groups Component (D): a solvent