| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an arc evaporation source that is controlled so that magnetism between a target and a substrate is enhanced and the inclination of a magnetic line on the surface of the target becomes vertical or becomes a direction directing to the central side (inner side) from the outer circumference of a cathode surface. <P>SOLUTION: The arc evaporation source includes a magnetic field generation mechanism 8 and an outer circumferential magnet 3. The magnetic field generation mechanism 8 is arranged along a direction where an axial center becomes nearly vertical to the front surface of a target 2 in the front of the target 2, and is formed in a ring shape to generate a magnetic field that is nearly vertical to the front surface of the target 2. The outer circumferential magnet 3 is formed in a ring shape, and is so arranged as to surround the outer periphery of the target 2 along a direction where the direction of magnetization becomes along the radial direction of the ring shape, and along a direction where the direction of magnetization becomes parallel to the front surface of the target 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
