Antireflective hardmask composition and a method of preparing a patterned material using same

摘要

An antireflective hardmask composition layer including a polymer having Si-O and non- silicon inorganic units in its backbone. The polymer includes chromophore and transparent moieties and a crosslinking component. The antireflective hardmask composition layer is employed in a method of forming a patterned material on a substrate.