PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME

摘要

OF THE DISCLOSUREA photoacid generator represented by the following formula (1), a ethod for producing the photoacid generator, and a resist composition containing the photoacid generator are provided.[Chemical Formula 1]0 I I A+ -0--S /jx) r C o n2R2/n OH wherein in the formula (1), Y, X, RI, R2, rn, 112 and Ab have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.