发明名称 NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY
摘要 A nanoimprint mold includes a flexible body and a molding layer formed on the flexible body. The molding layer includes a plurality of protrusions and recesses. The molding layer is a polymer material polymerized via a cross linking polymerization of a nanoimprint resist which includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator.
申请公布号 US2012244245(A1) 申请公布日期 2012.09.27
申请号 US201213459346 申请日期 2012.04.30
申请人 ZHU ZHEN-DONG;LI QUN-QING;ZHANG LI-HUI;CHEN MO;HON HAI PRECISION INDUSTRY CO., LTD.;TSINGHUA UNIVERSITY 发明人 ZHU ZHEN-DONG;LI QUN-QING;ZHANG LI-HUI;CHEN MO
分类号 B29C59/02 主分类号 B29C59/02
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