发明名称 Ultrathin spacer formation for carbon-based FET
摘要 A carbon-based field effect transistor (FET) includes a substrate; a carbon layer located on the substrate, the carbon layer comprising a channel region, and source and drain regions located on either side of the channel region; a gate electrode located on the channel region in the carbon layer, the gate electrode comprising a first dielectric layer, a gate metal layer located on the first dielectric layer, and a nitride layer located on the gate metal layer; and a spacer comprising a second dielectric layer located adjacent to the gate electrode, wherein the spacer is not located on the carbon layer.
申请公布号 US8274072(B2) 申请公布日期 2012.09.25
申请号 US201213401967 申请日期 2012.02.22
申请人 CHEN ZHIHONG;GUO DECHAO;HAN SHU-JEN;ZHAO KAI;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHEN ZHIHONG;GUO DECHAO;HAN SHU-JEN;ZHAO KAI
分类号 H01L29/76 主分类号 H01L29/76
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