发明名称 |
THIN FILM THROUGH-GLASS VIA AND METHODS FOR FORMING SAME |
摘要 |
This disclosure provides systems, methods and apparatus providing electrical connections through glass substrates. In one aspect, a thin film through-glass via including a through-glass via hole and a thin conductive film that conformally coats the sidewalls of the through-glass via hole is provided. A contour of a through-glass via hole may include concave portions that overlap at a midsection of the glass, with the through-glass via hole sidewalls curved inward to form the concave portions. In another aspect, one or more methods of forming through-glass vias are provided. In some implementations, the methods include double-sided processes to form aligned via holes in a glass substrate that together form a contoured through-glass via hole, followed by deposition of a thin continuous film of a conductive material.
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申请公布号 |
US2012235969(A1) |
申请公布日期 |
2012.09.20 |
申请号 |
US201113048768 |
申请日期 |
2011.03.15 |
申请人 |
BURNS DAVID WILLIAM;SHENOY RAVINDRA VAMAN;QUALCOMM MEMS TECHNOLOGIES, INC. |
发明人 |
BURNS DAVID WILLIAM;SHENOY RAVINDRA VAMAN |
分类号 |
G06F3/038;H01L23/48;H05K3/42;H05K7/00 |
主分类号 |
G06F3/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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