发明名称 THIN FILM THROUGH-GLASS VIA AND METHODS FOR FORMING SAME
摘要 This disclosure provides systems, methods and apparatus providing electrical connections through glass substrates. In one aspect, a thin film through-glass via including a through-glass via hole and a thin conductive film that conformally coats the sidewalls of the through-glass via hole is provided. A contour of a through-glass via hole may include concave portions that overlap at a midsection of the glass, with the through-glass via hole sidewalls curved inward to form the concave portions. In another aspect, one or more methods of forming through-glass vias are provided. In some implementations, the methods include double-sided processes to form aligned via holes in a glass substrate that together form a contoured through-glass via hole, followed by deposition of a thin continuous film of a conductive material.
申请公布号 US2012235969(A1) 申请公布日期 2012.09.20
申请号 US201113048768 申请日期 2011.03.15
申请人 BURNS DAVID WILLIAM;SHENOY RAVINDRA VAMAN;QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 BURNS DAVID WILLIAM;SHENOY RAVINDRA VAMAN
分类号 G06F3/038;H01L23/48;H05K3/42;H05K7/00 主分类号 G06F3/038
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