发明名称 TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM FOR STORING SUBSTRATE LIQUID PROCESSING PROGRAM
摘要 PURPOSE: A two-fluid nozzle, a substrate liquid-processing device, a substrate liquid-processing method, and an electronically decodable recording medium in which a substrate liquid-processing program is recorded are provided to prevent the damage of a substrate surface by preventing a liquid film from becoming a thin film. CONSTITUTION: A second fluid nozzle(34) includes a first liquid discharging hole(45) and a gas discharging hole(47). The second fluid nozzle mixes first liquid discharged from the first liquid discharging hole with gas discharged from the gas discharging hole. The second fluid nozzle discharges the mixed fluid(52) to a substrate. A second liquid discharging hole(53) supplies second liquid to an extensional part of a target spot or an inner side than the extensional part of the target spot.
申请公布号 KR20120103465(A) 申请公布日期 2012.09.19
申请号 KR20120022479 申请日期 2012.03.05
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO SATOSHI;KAI YOSHIHIRO
分类号 H01L21/302 主分类号 H01L21/302
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